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METHOD AND REACTOR DESIGN FOR LARGE-AREA VHF PLASMA PROCESSING WITH IMPROVED UNIFORMITY
METHOD AND REACTOR DESIGN FOR LARGE-AREA VHF PLASMA PROCESSING WITH IMPROVED UNIFORMITY
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机译:均匀性提高的大面积VHF等离子体处理的方法和反应器设计
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摘要
An apparatus for plasma processing of substrates is disclosed. A plasma processing chamber is provided which includes a chamber body and a lid. The lid includes a faceplate coupled to a backing plate. The faceplate and the backing plate are disposed within a processing volume defined by the chamber body and the lid. One or more ferrite blocks are coupled to the backing plate to modulate an electromagnetic field created by an RF current from an RF generator. A gas feed assembly including a gas source, a remote plasma source, and a zero field feed through are coupled to, and in fluid communication with, the processing volume through the backing plate and faceplate.
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