首页> 外文会议>Indium Phosphide and Related Materials, 1991., Third International Conference. >Impurity induced disordering of GaInAs quantum wells with barriers of AlGaInAs or of GaInAsP (MQW waveguides)
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Impurity induced disordering of GaInAs quantum wells with barriers of AlGaInAs or of GaInAsP (MQW waveguides)

机译:杂质诱导的具有AlGaInAs或GaInAsP(MQW波导)势垒的GaInAs量子阱无序

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The use of fluorine and boron to disorder two material systems for use at 1.5 mu m, GaInAs/AlGaInAs and GaInAs/GaInAsP, both lattice-matched to InP, is discussed. Three structures are investigated: two GaInAsP multiple quantum well (MQW) structures, a separate confinement heterostructure (SCH) and a graded index structure (GRIN), and an AlGaInAs MQW structure. It is shown that the P-quaternary disorders without any implants at annealing temperatures above 500 degrees C, and the Al-quaternary is stable up to annealing temperatures of 650 degrees C. At annealing temperatures of 600 degrees C for the P and 650 degrees C for the Al quaternary. boron causes some intermixing, probably due to the damage caused by implantation. A significant blue shift was achieved in material implanted with fluorine while, under the same annealing conditions, the control samples remained unchanged.
机译:讨论了使用氟和硼来扰乱两种材料系统,它们在1.5μm时均与InP晶格匹配,即GaInAs / AlGaInAs和GaInAs / GaInAsP。研究了三种结构:两种GaInAsP多量子阱(MQW)结构,单独的限制异质结构(SCH)和渐变折射率结构(GRIN),以及AlGaInAs MQW结构。结果表明,在高于500摄氏度的退火温度下,没有任何注入的P四元无序,并且Al第四元在650摄氏度的退火温度下是稳定的。对于P和650摄氏度,在600摄氏度的退火温度下对于Al第四纪。硼可能引起某些混合,这可能是由于植入造成的损坏。注入氟的材料实现了显着的蓝移,而在相同的退火条件下,对照样品保持不变。

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