首页> 外文会议>Indium Phosphide and Related Materials, 1991., Third International Conference. >Annealing and bulk crystal growth of undoped InP under controlled P-pressure: a perspective for the preparation of undoped SI InP?
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Annealing and bulk crystal growth of undoped InP under controlled P-pressure: a perspective for the preparation of undoped SI InP?

机译:未掺杂InP在受控P压力下的退火和块状晶体生长:制备未掺杂SI InP的一个视角?

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摘要

Nominally undoped semi-insulating InP is prepared reproducibly. The electrical properties of a large series of undoped InP samples, before and after annealing under controlled phosphorus pressure, are presented. Spectroscopic investigations show that iron is incorporated during annealing, but native defects have to be taken into consideration in order to explain the electrical data. Based on a survey of intrinsic defects in InP and on PL measurements of crystals with different stoichiometries, a perspective is given for the growth of undoped semi-insulating InP under controlled phosphorus pressure.
机译:可重复制备名义上无掺杂的半绝缘InP。介绍了在受控磷压力下退火之前和之后的大量未掺杂InP样品的电学性质。光谱研究表明,在退火过程中会掺入铁,但是必须考虑固有缺陷才能解释电数据。基于对InP中固有缺陷的调查以及具有不同化学计量比的晶体的PL测量,给出了在受控磷压下未掺杂半绝缘InP的生长的观点。

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