首页> 外文会议>Electronics Components Conference, 1988., Proceedings of the 38th >Stress relief in plastic-encapsulated, integrated circuit devices by die coating with photodefinable polymide
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Stress relief in plastic-encapsulated, integrated circuit devices by die coating with photodefinable polymide

机译:通过用可光定义的聚酰亚胺进行模具涂覆来缓解塑料封装的集成电路器件中的应力

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A photodefinable polyimide based on 3,3',4,4'-benzophenone tetracarboxylic dianhydride, oxydianiline, and metaphenylene-diamine (BTDA-ODA-MPD) was studied for its application as a stress buffer film over the passivation in a plastic-encapsulated device. The test vehicle was a bipolar-interface device containing piezoresistive circuits which, upon plastic encapsulation, would typically have 10% yield loss due to threshold voltage failure. Polyimide coating eliminates this loss by providing a buffer against stress imposed by the plastic encapsulant. Accelerated testing with unbiased and biased pressure cooker storage under 15 psig steam for over 1300 hr and 1000 temperature cycles between -65 degrees C and 150 degrees C confirmed the superior performance of the polyimide coated devices as compared with the uncoated control. The polyimide used, besides having the obvious advantage of requiring fewer process steps, was found to have higher film density and modulus of elasticity than to a standard polyimide of similar chemistry and is thus likely to have superior electrical and mechanical properties and higher resistance to moisture.
机译:研究了基于3,3',4,4'-二苯甲酮四羧酸二酐,羟二苯胺和间苯二胺(BTDA-ODA-MPD)的可光定义的聚酰亚胺在塑料封装中钝化过程中作为应力缓冲膜的应用设备。测试的车辆是一个双极接口设备,其中包含压阻电路,在塑料封装后,由于阈值电压故障,其典型的良率损失将为10%。聚酰亚胺涂层通过提供缓冲层来消除由塑料密封剂施加的应力,从而消除了这种损失。在15 psig蒸汽下,在-65摄氏度和150摄氏度之间的1300小时和1000个温度循环下,无偏压力锅的加速测试,证实了聚酰亚胺涂层设备与未涂层对照相比具有优越的性能。发现所用的聚酰亚胺除了具有需要较少工艺步骤的明显优势之外,还发现其膜密度和弹性模量比化学性质相似的标准聚酰亚胺要高,因此可能具有优异的电气和机械性能以及更高的耐湿性。

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