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8.5 GHz and 11.5 GHz Acoustic Delay Lines Using Higher-Order Lamb Modes in Lithium Niobate Thin Film

机译:铌酸锂薄膜中使用高阶Lamb模式的8.5 GHz和11.5 GHz声延迟线

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We present the first group of X-band acoustic delay lines (ADLs) in lithium niobate (LiNbO3) thin films. The fabricated miniature ADLs exploit the high phase velocities ($v_{p}$) and large electromechanical couplings ($k^{2}$) of the 2nd-order symmetric (S2) mode and the 3rd-order antisymmetric (A3) mode in Z-cut LiNbO3. The S2 passband centered at 8.55 GHz shows a minimum insertion loss (IL) of 13.3 dB, a 3-dB fractional bandwidth (FBW) of 1.20% and group delays between 11.5 ns and 93.6 ns, while the A3 passband centered at 11.5 GHz shows a minimum IL of 11.6 dB, an FBW of 1.14% and group delays between 9.0 ns and 65.1 ns. The $v_{p}$, group velocity ($v_{g}$), and propagation loss (PL) have been experimentally extracted. The demonstrated X-band ADL platform could potentially enable high-frequency passive signal processing functions for 5G applications.
机译:我们介绍了铌酸锂(LiNbO)中的第一组X波段声学延迟线(ADL) 3 )薄膜。伪造的微型ADL利用了高相速度( $ v_ {p} $ < / tex> )和大型机电联轴器( $ k ^ {2} $ 的2) nd 阶对称(S2)模式和3 rd Z切割LiNbO3中的三阶反对称(A3)模式。以8.55 GHz为中心的S2通带显示了13.3 dB的最小插入损耗(IL),1.20%的3 dB分数带宽(FBW)和11.5 ns至93.6 ns的群延迟,而以11.5 GHz为中心的A3通带显示最小IL为11.6 dB,FBW为1.14%,群延迟在9.0 ns至65.1 ns之间。这 $ v_ {p} $ < / tex> ,组速度( $ v_ {g} $ < / tex> ),并已通过实验提取了传播损耗(PL)。演示的X波段ADL平台可以潜在地为5G应用启用高频无源信号处理功能。

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