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A CMOS OxRAM-Based Neuron Circuit Hardened with Enclosed Layout Transistors for Aerospace Applications

机译:基于CMOS OxRAM的神经元电路,带有用于航空航天应用的封闭布局晶体管

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Brain-inspired computing architectures, brought by Artificial Neural Networks (ANNs), are an attractive solution to reduce the energy consumption of the conventional von Neumann’s computation, with an excellent parallel processing capability. Therefore, critical applications, such as Space & Satellite, which impose severe constraints in terms of power consumption and computing efficiency, are excellent candidates to embed such networks. Nonetheless, integrated circuits operating during long-term and cumulative exposure to incidence levels of ionizing radiation may have their physical components degraded, thus drastically reducing their reliability and expected lifetime. A possible solution to enhance the radiation hardening characteristics of a conventional bulk CMOS device is to use the non-standard gate geometry referred to as Enclosed Layout Transistor (ELT). In this work, we propose to harden the design of an existing OxRAM-based neuron circuit [1] through the inclusion of ELTs, i.e., to improve the radiation hardening characteristics of a preexistent convenient neuron circuit topology by using the enclosed gate geometry for the n,pMOS devices. Electrical simulations, considering a standard commercial bulk CMOS fabrication process, in a 1SO nm technology, have been carried out to validate our proposed design. The simulation results, supported by the analysis of former works regarding the incidence of ionizing radiation in OxRAM and ELTs, indicate that the proposed hardened neuron circuit is a feasible solution to embed neuromorphic computing in aerospace applications.
机译:人工神经网络(ANN)带来的灵感来自大脑的计算体系结构是一种有吸引力的解决方案,具有出色的并行处理能力,可以减少传统冯·诺依曼计算的能耗。因此,在功耗和计算效率方面施加严格限制的关键应用(例如太空与卫星)是嵌入此类网络的极佳选择。但是,在长期累积暴露于电离辐射的入射水平下工作的集成电路,其物理组件可能会退化,从而大大降低其可靠性和预期寿命。增强常规体CMOS器件的辐射硬化特性的可能解决方案是使用称为封闭布局晶体管(ELT)的非标准栅极几何形状。在这项工作中,我们建议通过包括ELT来加强现有基于OxRAM的神经元电路的设计[1],即通过使用封闭的门几何来改善先前便利的神经元电路拓扑的辐射硬化特性。 n,pMOS器件。在1SO nm技术中,考虑了标准的商用块CMOS制造工艺,进行了电气仿真,以验证我们提出的设计。仿真结果得到有关OxRAM和ELT中电离辐射发生率的先前工作的分析的支持,表明所提出的硬化神经元电路是在航空航天应用中嵌入神经形态计算的可行解决方案。

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