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Design of a Novel Hybrid CMOS Non-Volatile SRAM Memory in 130nm RRAM Technology

机译:130nm RRAM技术的新型混合CMOS非易失性SRAM存储器设计

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Static Random-Access Memories (SRAMs) are an integral part of the chip industry, occupying a noticeable share of the memory market due to their high performance and compatibility with CMOS technology. Traditional SRAMs lack the capability to retain data after power-off, restricting their availability in applications such as battery-powered mobile devices where non-volatility associated with zero-leakage currents is needed. This paper presents a novel Non-Volatile SRAMs (NVSRAMs) device based on Resistive RAM (RRAM) technology. A comparison between SRAM and NVSRAM performances is proposed at both cell and memory array level. The comparison covers several metrics such as power consumption, area and design complexity. The presented circuits are implemented in a 130-nm high voltage CMOS technology from STMicroelectronics.
机译:静态随机存取存储器(SRAM)是芯片行业不可或缺的一部分,由于其高性能和与CMOS技术的兼容性,因此在存储器市场上占有明显份额。传统的SRAM缺乏断电后保留数据的能力,从而限制了它们在诸如电池供电的移动设备等需要零泄漏电流相关的非易失性应用中的可用性。本文介绍了一种基于电阻RAM(RRAM)技术的新型非易失性SRAM(NVSRAM)器件。建议在单元和存储器阵列级别上比较SRAM和NVSRAM的性能。比较涵盖了多个指标,例如功耗,面积和设计复杂性。所展示的电路采用意法半导体(STMicroelectronics)的130纳米高压CMOS技术实现。

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