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Transport charge of gallium arsenide films synthesized on polycrystalline silicon by ion ablation

机译:通过离子消融在多晶硅硅合成的砷化镓薄膜的运输电荷

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Electrophysical and photoelectric properties of thin GaAs films deposited on polysilicon by pulse ion ablation using high-power ion beams have been investigated. The predominant charge carriers transfer mechanism in films and the type of dark and photoconductivity have been established. A vacuum annealing effect (10~(-2) Pa, 300-1000 K) on energetic and kinetic characteristics of dark and photoconductivity, the transfer mechanism and the type of charge carriers have been determined. The most probable causes of changes in the film electric and photoelectric characteristics have been discussed.
机译:研究了使用高功率离子束沉积在多晶硅上沉积在多晶硅上的薄GaAs膜的电神科和光电性能。已经建立了薄膜中的主要电量载体转移机制和暗和光电导的类型。真空退火效果(10〜(-2)PA,300-1000 k)对暗和光电导性的高能量和动力学特性,已经确定了转移机构和电荷载体的类型。已经讨论了薄膜电和光电特性的最可能原因。

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