MEASUREMENT OF ELEMENTAL COMPOSITION OF FeNi AND SiGe ALLOY THIN FILMS BY EPMA AND μ-XRF

摘要

It was demonstrated in the past that the electron probe microanalysis (EPMA) can be applied to determine accurately both elemental composition and thickness of thin films [1-3] by using the dedicated software package for thin film analysis Stratagem [4]. A relatively small number of film materials such as pure metallic films of platinum and nickel [1]. binary alloys of Fe-Ni [2], and Pt-Ni-Co ternary alloy films [3] has been reported in literature as working successfully. Further, the software can be applied 'inversely', i.e., by feeding it with the thickness of the film and using the determined mass coating, one can easily calculate the film density, which for porous layers leads us to the true film porosity [5].