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Properties of hydrogen plasma treated Gallium and Aluminum co-doped Zinc Oxide films

机译:氢等离子体处理镓和铝共掺杂氧化锌膜的性质

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Gallium and Aluminum co-doped Zinc Oxide (GAZO) films were prepared by in-line sputtering at room temperature. After that, the GAZO films were treated with different treatment time of microwave hydrogen plasma. The treatment time of microwave hydrogen plasma varied from 1 to 10 minutes. The surface roughness of GAZO films increases with the treatment time and was observed from scanning electron microscope. The increase of surface roughness can be attributed to re-crystallization of GAZO films after microwave hydrogen plasma treatment. Microwave hydrogen plasma annealing can improve the electrical and optical properties of GAZO films. The 5.6 × 10 ~4Ω-cm in electrical resistivity and 93% in average optical transmittance with visible wavelength region can be obtained for GAZO films after microwave hydrogen plasma treatment of 5 minutes.
机译:通过在室温下在线溅射制备镓和铝共掺杂氧化锌(Gazo)膜。之后,用微波氢等离子体的不同处理时间处理Gazo薄膜。微波氢等离子体的处理时间从1到10分钟变化。 Gazo膜的表面粗糙度随治疗时间的增加,并从扫描电子显微镜观察。表面粗糙度的增加可归因于微波氢等离子体处理后重结晶Gazo膜。微波氢等离子体退火可以改善Gazo薄膜的电气和光学性质。电阻率的5.6×10〜4Ω-cm和平均光学透射率为93%,在微波氢等离子体处理5分钟后,可以获得Gazo薄膜的光学透射率。

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