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Multi-Finger High Power Gallium Nitride Based High Electron Mobility Transistors

机译:基于多指高功率氮化镓的高电子迁移率晶体管

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This work explores the effect of varying widths and multi-fingers on the DC performance of Gallium Nitride power High Electron Mobility Transistors (GaN HEMTs). The experimental observations match with the expected theoretical calculations. The saturation drain current is found to scale linearly with width (W) for a fixed number of fingers (n), whereas it is observed to follow a stronger than expected dependence on n for a fixed W. This dependence on n tends towards linear as we go to higher values of drain voltages. The on-resistance and the maximum transconductance of the devices, separated from the extra leakage components, follow the expected dependence on n and W.
机译:这项工作探索了不同宽度和多指对氮化镓功率高电子迁移率晶体管(GaN HEMT)的直流性能的影响。实验观察结果与预期的理论计算相符。对于固定数量的手指(n),发现饱和漏极电流随宽度(W)呈线性比例变化,而对于固定W,观察到其对n的依赖性强于预期。对n的这种依赖性趋于线性关系,即我们选择更高的漏极电压值。器件的导通电阻和最大跨导与额外的泄漏分量分开,遵循对n和W的预期依赖关系。

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