Application of Ion Beam Etching Technology in Spacecraft Encoder Lithography

摘要

The encoder is a core component of encoding sun sensor, the photolithography precision and quality has the serious impact on the measurement accuracy of sun sensor. Traditional encoder photolithography uses wet etching technology, and line edge has sawtooth and burr phenomenon, photolithography accuracy is low, can not meet the aerospace products high precision and high quality requirements. In this paper, iron beam etching technique is used to verify the feasibility of ion beam etching technology used in encoder, which solves the problem of edge sawtooth and burr, and the technical problems of low photolithography accuracy, which laid the foundation for the further development of products to higher precision.