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Design of advanced subthreshold SRAM array for ultra-low power technology

机译:用于超低功耗技术的高级亚阈值SRAM阵列设计

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With scaling of CMOS technology, data stability of SRAM at ultra-low supply voltage has become a critical issue for wearable system applications. In this paper, we present an advanced 8T SRAM which can operate properly in subthreshold voltage regime. The bit-cell utilizes a differential swing in the read and write path, and allows an efficient column-interleaving structure. In the read operation, a column-wise assistline scheme of the cell leads to the cell being unaffected by the read disturbance. In addition, the bit-cell keeps the noise-vulnerable data 'low' node voltage close to the ground level during the dummy-read operation, thus producing near-ideal voltage transfer characteristics essential for robust SRAM functionality. In the write access, the boosted wordline facilitates to change the contents of the memory bit. Implementation results with 180 nm CMOS technology exhibit that the proposed SRAM remains unaffected by the read disturbance, while achieves 59.8 % higher dummy-read stability and 3.7 times better write-ability at a subthreshold supply voltage compared to the conventional 6T SRAM.
机译:随着CMOS技术的发展,超低电源电压下SRAM的数据稳定性已成为可穿戴系统应用的关键问题。在本文中,我们提出了一种先进的8T SRAM,它可以在亚阈值电压范围内正常工作。该位单元利用读写路径中的差分摆幅,并允许有效的列交织结构。在读取操作中,单元的列式辅助线方案导致该单元不受读取干扰的影响。此外,在虚拟读取操作期间,位单元将易受噪声影响的数据“低”节点电压保持在接近地电平的水平,从而产生了对理想的鲁棒SRAM功能必不可少的近乎理想的电压传输特性。在写访问中,增强字线有助于更改存储位的内容。 180 nm CMOS技术的实现结果表明,所提出的SRAM不受读干扰的影响,而在低于阈值的电源电压下,与传统的6T SRAM相比,伪读取稳定性提高了59.8%,写能力提高了3.7倍。

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