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Suppressed Shot Noise of RF Short–Channel MOSFETs

机译:抑制RF短沟道MOSFET的散粒噪声

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摘要

The suppressed characteristics of shot noise of 40nm n-MOSFETs in high-frequency band are observed by modeling and measuring its drain current noise. On the basis of the analysis of the microelectronic physical structure of 40nm MOSFETs, a concise model for the drain current noise of the device is built according to the extraction results of the small signal equivalent circuit parameters. The accuracy of the proposed model is verified by noise measurements, and the intrinsic drain current noise is proved to be suppressed shot noise, and with the decrease of the gate voltage, the suppressed degree gradually decreases until it disappears.
机译:通过建模和测量其漏极电流噪声,可以观察到40nm n-MOSFET在高频带中散粒噪声的抑制特性。在对40nm MOSFET的微电子物理结构进行分析的基础上,根据小信号等效电路参数的提取结果,建立了器件漏极电流噪声的简洁模型。通过噪声测量验证了所提模型的准确性,并证明了本征漏极电流噪声被抑制为散粒噪声,并且随着栅极电压的降低,抑制程度逐渐减小直至消失。

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