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Bonding strength characterization of eutectic-based WLP using molecular dynamics and wafer level shear testing

机译:基于共晶WLP的键合强度表征,采用分子动力学和晶片水平剪切测试

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This paper investigated the bonding shear strength of eutectic-based wafer-level-packaging (WLP) for piezoresistive MEMS accelerometers. The bonding conditions were experimentally and analytically determined to realize higher shear strength without a diffusion of the solder material atoms to the adhesion layers: the energy dispersive X-ray (EDX) spectrometry and molecular dynamics (MD) simulations clarified the eutectic reaction of solder materials used in this research. Consequently, the bonding load of 9.8 kN and the temperature of 300 °C was found to be one of rational conditions because of a sufficient shear strength to endure the polishing process after the WLP and few diffusion of solder material atoms to the adhesion layer.
机译:本文研究了压阻MEMS加速度计的基于共晶的晶圆级封装(WLP)的键合剪切强度。通过实验和分析确定键合条件,以实现更高的剪切强度,而不会使焊料材料原子扩散到粘合层:能量色散X射线(EDX)光谱法和分子动力学(MD)模拟阐明了焊料材料的共晶反应在这项研究中使用。因此,发现有9.8 kN的键合载荷和300°C的温度是合理的条件之一,因为足够的剪切强度足以承受WLP之后的抛光过程,并且焊料材料原子很少扩散到粘合层。

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