The emission capability of as prepared reduced graphene oxide (rGO) and tungsten doped reduced graphene oxide (W-rGO) film field emitter (FE) cathodes are investigated experimentally. It is observed that W-rGO films showed a highest emission current density of ~ 800 A/cm2at an applied DC electric field of 6.6 V/μm, which is far superior than the current density of ~ 390 A/cm2from an as prepared rGO film. Short stability test also showed that emission current is much more stable than the rGO films. These excellent improvements can be attributed to the doping of tungsten into the rGO film, which helped to repair the broken bonds thus lowering the turn on field. Also, tungsten gives the film an excellent mechanical stability and higher thermal load handling capability, which is very important to achieve a stable, high performance operation and long life.
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机译:实验研究了所制备的还原型氧化石墨烯(rGO)和钨掺杂的还原型氧化石墨烯(W-rGO)薄膜场发射器(FE)阴极的发射能力。观察到W-rGO薄膜显示出最高的发射电流密度,约为800 A / cm
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在施加的6.6 V /μm直流电场下,远远优于〜390 A / cm的电流密度
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来自准备好的rGO电影。短时稳定性测试还表明,发射电流比rGO膜要稳定得多。这些出色的改进可归因于将钨掺杂到rGO膜中,这有助于修复断裂的键,从而降低了导通场。另外,钨使薄膜具有出色的机械稳定性和更高的热负荷处理能力,这对于实现稳定,高性能的操作和长寿命非常重要。
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