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Raman spectrometry of carbon nanotubes using an Al-catalyst supported layer on nickel film deposited on silicon substrate

机译:在沉积在硅衬底上的镍膜上使用Al催化剂负载层的碳纳米管的拉曼光谱法

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Carbon nanotubes (CNTs) were grown on Ni catalyst with Al catalyst supported layer prepared on silicon substrate at different temperatures by TCVD. TEM images clearly showed the multi-wall structure of carbon nanotubes (MWCNTs) and SEM images revealed that the average diameters of MWCNTs were 116, 121, 142 and 162 nm for the growing temperatures of 600, 700, 800 and 900°C, respectively. The increase of tube diameter was due to the difference of Ni particle size and distribution after pretreatment. Raman spectrum revealed the two peaks of the D and G band at 1282-1290 and 1588.1-598 cm~(-1), respectively. The tubes grown at 800°C showed a shoulder peak of G band at 1598 cm~(-1). The minimum of defect induced disorder (I_d/I_g) of 1.19 was found at 800°C whereas the maximum disorder of 1.70 was observed at 600°C. All results confirm that the tube growth at 800°C shows the minimum imperfective disorder and the tube diameter can be manipulated by the Ni particle size and distribution.
机译:在通过TCVD的不同温度下在硅衬底上制备的Al催化剂负载层在Ni催化剂上生长碳纳米管(CNT)。 TEM图像清楚地显示了碳纳米管(MWCNT)和SEM图像的多壁结构,显示MWCNT的平均直径为116,121,142和162nm,分别为600,700,800和900°C的生长温度。管直径的增加是由于预处理后Ni粒度和分布的差异。拉曼光谱分别揭示了1282-1290和1588.1-598cm〜(-1)的D和G带的两个峰。在800℃下生长的管显示为1598cm〜(-1)的G带的肩峰。在800℃下发现1.19的缺陷诱导紊乱(I_D / I_g)的最小值,而在600℃下观察到最大疾病1.70。所有结果证实,800°C的管生长显示最小的缺陷障碍,管直径可以通过Ni粒度和分布进行操纵。

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