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Nanostructured Multilayer Composite Films of Manganese Dioxide/Nickel/Copper Sulfide Deposited on Polyethylene Terephthalate Supporting Substrate

机译:沉积在聚对苯二甲酸乙二醇酯支撑基质上的二氧化锰/镍/铜硫化物的纳米结构多层复合膜

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Nanostructured multilayer manganese dioxideickel/copper sulfide (MnO2/Ni/CuS) composite films were successfully deposited onto supporting polyethylene terephthalate (PET) substrate through the sequential deposition of CuS, Ni, and MnO2thin films by chemical bath deposition, electrodeposition, and horizontal submersion deposition techniques, respectively. Deposition of each thin-film layer was optimized by varying deposition parameters and conditions associated with specific deposition technique. Both CuS and Ni thin films were optimized for their electrical conductivity whereas MnO2thin film was optimized for its microstructure and charge capacity. The electrochemical properties of nanostructured multilayer MnO2/Ni/CuS composite films were evaluated by cyclic voltammetry as electrode materials of an electrochemical capacitor prototype in a dual-planar device configuration. Cyclic voltammogram in mild Na2SO4aqueous electrolyte exhibited a featureless and almost rectangular shape which was indicative of the ideal capacitive behavior and high cycling reversibility of the electrochemical capacitor prototype. Nanostructured multilayer MnO2/Ni/CuS composite films on supporting polyethylene terephthalate (PET) substrate could potentially be utilized as electrode materials for the fabrication of high performance electrochemical capacitors.
机译:通过化学浴沉积,电沉积和水平沉积依次沉积CuS,Ni和MnO2薄膜,将纳米结构多层二氧化锰/镍/铜硫化物(MnO2 / Ni / CuS)复合薄膜成功沉积到了支持的聚对苯二甲酸乙二醇酯(PET)衬底上浸没沉积技术,分别。通过改变沉积参数和与特定沉积技术相关的条件来优化每个薄膜层的沉积。 CuS和Ni薄膜的导电性均得到优化,而MnO2薄膜的微观结构和电荷容量均得到优化。通过循环伏安法评估了纳米结构多层MnO2 / Ni / CuS复合膜的电化学性能,将其作为双平面器件结构中电化学电容器原型的电极材料。温和的Na2SO4水溶液中的循环伏安图显示出无特征且几乎呈矩形,这表明电化学电容器原型具有理想的电容性能和高循环可逆性。支撑聚对苯二甲酸乙二醇酯(PET)衬底上的纳米结构多层MnO2 / Ni / CuS复合膜可潜在地用作制造高性能电化学电容器的电极材料。

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