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Devices based on InGaN/GaN multiple quantum well for scintillator and detector applications

机译:基于InGaN / GaN多量子阱的器件,适用于闪烁体和探测器应用

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Fast scintillators are necessary for electron microscopes, as well as in many other application fields like medical diagnostics and therapy and fundamental science. InGaN/GaN multiple quantum well structures (QW) are perspective candidates due to strong exciton binding energy, high quantum efficiency, short decay time in order of ns and good radiation resistance. The aim of our work is to prepare scintillator structure with fast luminescence response and high intensity of light. InGaN/GaN multiple QW structures described here were prepared by metal-organic vapour phase epitaxy and characterized by high resolution X-ray diffraction measurements. We demonstrate structure suitability for scintillator application including a unique measurement of wavelength-resolved scintillation response under nanosecond pulse soft X-ray source in extended dynamical and time scales. The photo-, radio- and cathodo-luminescence (PL, RL, CL) were measured. We observed double peak luminescence governed by different recombination mechanisms: i) exciton in QW and ii) related to defects. We have shown that for obtaining fast and intensive luminescence response proper structure design is required. The radioluminescence decay time of QW exciton maximum decreased 4 times from 16 ns to 4 ns when the QW thickness was decreased from 2.4 nm to 2 nm. We have proved suitability of InGaN/GaN structures for fast scintillator application for electron or other particle radiation detection. For x-ray detection the fast scintillation response would be hard to achieve due to the dominant slow defect luminescence maximum.
机译:快速闪烁体是电子显微镜以及许多其他应用领域(如医学诊断和治疗以及基础科学)所必需的。 InGaN / GaN多量子阱结构(QW)由于具有强大的激子束缚能,高量子效率,ns量级的短衰减时间和良好的抗辐射性而成为透视候选材料。我们的工作目的是制备具有快速发光响应和高强度光的闪烁体结构。本文所述的InGaN / GaN多个QW结构是通过金属有机气相外延制备的,并通过高分辨率X射线衍射测量进行了表征。我们展示了适用于闪烁体的结构适用性,包括在扩展的动态和时间尺度上对纳秒级脉冲软X射线源下波长分辨的闪烁响应进行的独特测量。测量了光,无线电和阴极发光(PL,RL,CL)。我们观察到由不同重组机制控制的双峰发光:i)QW中的激子和ii)与缺陷有关。我们已经表明,为了获得快速和强烈的发光响应,需要适当的结构设计。当QW厚度从2.4 nm减小到2 nm时,QW激子最大值的放射发光衰减时间从16 ns减小到4 ns,减少了4倍。我们证明了InGaN / GaN结构适用于快速闪烁体应用,用于电子或其他粒子辐射检测。对于X射线检测,由于主要的缓慢缺陷发光最大值,很难实现快速闪烁响应。

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