【24h】

Energy enhancement on NV-GSD-HE

机译:NV-GSD的能量增强 - 他

获取原文

摘要

Higher energy boron implantation has been being required for CCD application on the NV-GSD-HE (HE). The HELINAC acceleration system has characteristics that acceleration emciency is dependent on a mass-to-charge ratio of ions to be accelerated. The maximum energy of boron is 2.3 MeV while that of phosphorus is 3.0 MeV since the original HE was designed to maximize the acceleration efficiency for singly charged phosphorus, while that for multiply charged boron is relatively poorer. New configuration of RF acceleration on the HE has been developed in order to increase the maximum energy of boron. On this configuration newly designed RF electrodes and electrostatic quadrupole lenses optimized for small mass-to-charge ratio ions are introduced, replacing the original electrodes and quadrupole lenses. As a result, the maximum energy of triply charged boron is increased up to 2.94 MeV and the maximum energy of doubly charged phosphorus is 2.6 MeV. Therefore, the newly configured tool can be used both for the CCD application and the well formation, including the triple well.
机译:较高的能量注入硼已被要求用于在NV-GSD-HE(HE)CCD应用。所述HELINAC加速系统具有以下特征:加速度emciency依赖于离子的质荷比被加速。硼的最大能量是2.3兆电子伏特,而磷的是,因为原来的HE被设计成最大化单电荷磷的加速效率3.0兆电子伏,而对于多电荷硼是相对较差的。在HE RF加速度的新的配置已开发以便增加硼的最大能量。此配置新设计的RF电极以及用于小质荷比的离子优化静电四极透镜的引入,替换原始电极和四极透镜。其结果是,三电荷的硼的最大能量增大到2.94兆电子伏和双电荷磷的最大能量是2.6兆电子伏。因此,新配置的工具可以用于CCD应用和阱形成,包括三阱可以使用两者。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号