Implantation mode dependence of damage structure depth profiles in Al{sub}2O{sub}3 irradiated with triple beam of H, He and heavy ions

摘要

The damage structures in Al{sub}2O{sub}3 after triple ion beam (H, He and/or N, O) irradiation were examined with cross-sectional TEM. Heavier ions penetrating depths of He-and H-ions implantation enhanced growth of cavities produced by He- and H-ions, as compared with those produced by He-and H-ions only. Although peaks for He- and H-ion implantation distribution are predicted by TRIM calculation to coincide each other, cavity formation revealed the peaks to be separated appreciably.