首页> 外国专利> RANGE MEASURING APPARATUS OF ION BEAM, RANGE MEASURING METHOD OF ION BEAM USING THE APPARATUS AND CONTROL METHOD OF IMPLANTATION DEPTH IN ION IRRADIATION USING THE APPARATUS

RANGE MEASURING APPARATUS OF ION BEAM, RANGE MEASURING METHOD OF ION BEAM USING THE APPARATUS AND CONTROL METHOD OF IMPLANTATION DEPTH IN ION IRRADIATION USING THE APPARATUS

机译:离子束的测距装置,使用该装置的离子束测距方法和使用该装置的离子辐照深度控制方法

摘要

PURPOSE: To perform the high-accuracy range measurement of an ion beam quickly and simply. ;CONSTITUTION: A range measuring apparatus is constituted so as to be provided with a collimator 3 which limits the angle of incidence of an ion beam, with a thin plate 4 whose quality is identical to that of an irradiation material, with a pedestal 5 which is arranged at the rear part of the thin plate 4, with ampere meters 2a, 2b which measure a current flowing in the thin plate 4 and the pedestal 5, with a cylindrical case 7 which supports the collimator 3, the thin plate 4 and the pedestal 5 and with a permanent magnet 6 which gives a magnetic field at a prescribed magnitude in a direction perpendicular to the irradiation direction of the ion beam near the cylindrical case 7.;COPYRIGHT: (C)1996,JPO
机译:目的:快速,简单地执行离子束的高精度范围测量。 ;构成:一种测距装置,其构成为具有限制离子束入射角的准直仪3,质量与辐照材料相同的薄板4,以及具有基座5的基座。电容器A布置在薄板4的后部,其安培计2a,2b用于测量在薄板4和基座5中流动的电流,并且圆柱形壳体7支撑准直仪3,薄板4和外壳。基座5和具有永久磁铁6的永久磁铁6,该永久磁铁在与圆筒形壳体7附近的离子束的照射方向垂直的方向上以规定的大小产生磁场;版权:(C)1996,JPO

著录项

  • 公开/公告号JPH08285950A

    专利类型

  • 公开/公告日1996-11-01

    原文格式PDF

  • 申请/专利权人 SUMITOMO HEAVY IND LTD;

    申请/专利号JP19950089723

  • 发明设计人 KATAOKA SHOJI;HIASA SHUNICHI;

    申请日1995-04-14

  • 分类号G01T1/29;H01J37/317;H01L31/09;

  • 国家 JP

  • 入库时间 2022-08-22 04:01:51

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