首页> 外文会议>International Conference on Nanotechnology >Study of ballasting carbon nanotube field emitter arrays with coaxial gate using doped silicon resistor
【24h】

Study of ballasting carbon nanotube field emitter arrays with coaxial gate using doped silicon resistor

机译:掺杂硅电阻的同轴栅镇流碳纳米管场致发射器阵列研究

获取原文

摘要

One of the limitations of carbon nanotube (CNT) field emitter arrays (FEA) is the non-uniformity of total emission current contribution from each emitter due to geometry variation among CNT field emitters. We previously used a ballast resistor to ballast each emitter's current contribution to improve the reliability and stability of our CNT field emission (FE) cathode with coaxial gate. However, this approach has two main disadvantages: reduced FE current and enlarged power dissipation. In this paper, we improve the ballasting of our CNT FEA with coaxial gate using a doped silicon resistor. Each CNT field emitter is in series with a doped silicon resistor to avoid over current, based on the saturation of drift velocity in doped silicon. The FE current from each emitter can be limited at a desired current level based on the doping density and size of the doped silicon resistor. Those dominating emitter can be protected as gate voltage increases. The proposed approach is expected to improve our CNT cathode reliability and stability.
机译:碳纳米管(CNT)场发射器阵列(FEA)的局限性之一是每个发射器的总发射电流贡献的不均匀性,这归因于CNT场发射器之间的几何形状变化。我们以前使用镇流电阻器来镇流每个发射极的电流,以提高带有同轴栅极的CNT场发射(FE)阴极的可靠性和稳定性。但是,这种方法有两个主要缺点:FE电流减小和功耗增大。在本文中,我们使用掺杂的硅电阻器改善了带有同轴栅极的CNT FEA的镇流性能。每个CNT场发射器均与掺杂的硅电阻器串联,以避免过电流,这取决于掺杂硅中漂移速度的饱和度。来自每个发射极的FE电流可以基于掺杂硅电阻的掺杂密度和尺寸限制在所需的电流水平。随着栅极电压的增加,那些主要的发射极可以得到保护。所提出的方法有望改善我们的CNT阴极可靠性和稳定性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号