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Performance of the forward-biased RF-LNA with deep n-well NMOS transistor

机译:具有深N-Well NMOS晶体管的前向偏置RF-LNA的性能

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This paper presents the merits and demerits of incorporating deep n-well (DNW) implantation NMOS structures in a forward-biased RF-Low Noise Amplifier (LNA). Two versions of a fully-integrated 2.45 GHz LNA design with forward-biasing are presented, a standard transistor version and a DNW transistor version, to evaluate potential improvements or possible degradation in performance by using a DNW structure. The RF performance characteristics of the standard LNA version are compared to the performance of the DNW LNA version. Simulation results had shown that the performance of the power gain and noise figure has been significantly boosted through the use of the DNW transistor structure as amplifying devices.
机译:本文介绍了将深N阱(DNW)植入NMOS结构的优点和缺点掺入正向偏置的RF低噪声放大器(LNA)中。通过使用DNW结构,提出了具有前进偏置的完全集成的2.45 GHz LNA设计的两个版本,标准晶体管版本和DNW晶体管版本,以评估潜在的改进或可能的性能下降。将标准LNA版本的RF性能特性与DNW LNA版本的性能进行比较。仿真结果表明,通过使用DNW晶体管结构作为放大装置,通过使用DNW晶体管结构显着提高了功率增益和噪声系数的性能。

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