首页> 外国专利> Semiconductor Circuit using Vertical Bipolar Junction Transistor implemented by deep n-well CMOS process

Semiconductor Circuit using Vertical Bipolar Junction Transistor implemented by deep n-well CMOS process

机译:采用深n阱CMOS工艺实现的使用垂直双极结型晶体管的半导体电路

摘要

Deep enwel Mr. semiconductor circuit using a vertical bipolar junction transistors implemented in MOS process is started. Amplifier circuit according to the present invention, coupled to the input node and the output node and, amplifying the input signal and having an amplifier transistor and a load connected between the output node and a predetermined power supply voltage node, for generating an output signal. The amplifying transistor is implemented with a vertical-type bipolar junction transistors implemented as deep enwel CMOS process. Variable gain amplifier circuit or a single pole log domain circuit according to the invention is also configured to include a vertical-type bipolar junction transistors implemented as deep enwel CMOS process. According to the present invention, a break in the hold submitter threaded region having superior properties compared to the device in place of MOSFET devices that operate dip enwel seed a vertical BJT devices that can be obtained from moss process amplifier, variable gain amplifier circuit and a single-pole log domain By using such a circuit, the characteristics of these circuits is improved.
机译:开始使用在MOS工艺中实现的垂直双极结型晶体管的深磁先生半导体电路。根据本发明的放大电路,耦合到输入节点和输出节点,并且放大输入信号,并且具有放大晶体管和连接在输出节点和预定电源电压节点之间的负载,用于产生输出信号。放大晶体管由实施为深磁CMOS工艺的垂直型双极结晶体管实现。根据本发明的可变增益放大器电路或单极对数域电路也被配置为包括实现为深磁CMOS工艺的垂直型双极结型晶体管。根据本发明,在保持提交器螺纹区域中的断裂具有比该器件更优越的性能,该器件代替了操作浸涂种子的MOSFET器件和垂直BJT器件,该器件可以从moss过程放大器,可变增益放大器电路和单极对数域通过使用这种电路,可以改善这些电路的特性。

著录项

  • 公开/公告号KR100801056B1

    专利类型

  • 公开/公告日2008-02-04

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20060006477

  • 发明设计人 남일구;문현원;

    申请日2006-01-20

  • 分类号H03F3/45;H03F1/30;

  • 国家 KR

  • 入库时间 2022-08-21 19:52:36

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