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Performance evaluation of optimized transistor networks built using independent-gate FinFET

机译:使用独立栅极FinFET构建的优化晶体管网络的性能评估

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MOS planar technology has been used in fabrication of integrated circuits in the last decades. However, the short channel effects in the subthreshold operation region are becoming a critical restriction to the channel length reduction. With the use of FinFET devices, the scaling increases due the reduction of short channel effects. FinFET offers the possibility of independent gate controlling that can be efficiently exploited in logic reduction (network optimization), but with direct impact in the electrical performance of logic gates. In this work, it is presented the electrical analysis in terms of signal delay propagation and energy consumption of compacted transistor networks. Different logic gate implementations corresponding to the same Boolean function behavior are compared. The results demonstrate the existing tradeoff between these two parameters.
机译:在过去的几十年中,MOS平面技术已用于集成电路的制造中。但是,亚阈值操作区域中的短通道效应正成为减小通道长度的关键限制。随着FinFET器件的使用,由于减小了短沟道效应,缩放比例增加了。 FinFET提供了独立的栅极控制的可能性,可以在逻辑简化(网络优化)中有效地利用它,但是直接影响逻辑门的电气性能。在这项工作中,从信号延迟传播和紧凑型晶体管网络的能耗方面介绍了电气分析。比较对应于相同布尔函数行为的不同逻辑门实现。结果证明了这两个参数之间的现有折衷。

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