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ON MICROSTRUCTURE AND ELECTRONIC PROPERTIES OF BORON CARBIDE

机译:碳化硼的微观结构和电子性能

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Boron carbide (homogeneity range B_(4.3)C - B_(~11)C) exhibits ~ 15 atoms per elementary cell and is composed of B_(12) or B_(11)C icosahedra and linear structure elements CBC, CBB or B□B (□, vacancy), whose shares depend on the chemical composition. Their random distribution excludes x-ray diffraction and NMR from structure analysis. Phonon spectroscopy on isotopically pure boron carbide solves this problem. - Experimental investigations established semiconducting character. They contrast with theoretical band structure calculations concluding metallic behavior because of being based on incorrect idealized structures. The actual band scheme (gaps 2.09 and 2.41 eV) exhibiting high-density gap states allows consistently interpreting the experimental results. - Seebeck coefficients of ~300 μV/K up to 2000 K make it a promising candidate for thermoelectric energy conversion. Theoretical speculations on superconductivity up to 36.7 K were not confirmed.
机译:碳化硼(均质范围B_(4.3)C-B_(〜11)C)每个基本单元显示约15个原子,并且由B_(12)或B_(11)C二十面体和线性结构元素CBC,CBB或B□组成B(□,空位),其份额取决于化学成分。它们的随机分布从结构分析中排除了X射线衍射和NMR。同位素纯碳化硼的声子光谱法解决了这个问题。 -实验研究确定了半导体特性。它们与基于金属行为的理论能带结构计算形成对比,因为它们基于不正确的理想化结构。实际的带方案(间隙2.09和2.41 eV)表现出高密度的间隙状态,可以始终如一地解释实验结果。 -高达2000 K的约300μV/ K的塞贝克系数使其成为热电能量转换的有希望的候选者。尚未证实有关高达36.7 K的超导性的理论推测。

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