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Numerical study of electrical characteristics in RF micro discharge

机译:射频微放电电学特性的数值研究

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In this paper, a numerical study of electrical characteristics is investigated for a argon micro discharge generated by a radio- frequency excitation (13.56 MHz) at high pressure (100Torr) and low voltage (150V). The results show that the rf voltage is responsible for the increase of plasma potential. Moreover, we found that the rise of gas temperature causes a reduction of plasma density inside and outside the hole of the micro hollow cathode and also affects a decrease of plasma potential in the sheaths. In consequently the sheath's thickness becomes wide. The evolution of electron temperature in the sheaths is affected by the temperature of the gas in the micro-reactor. The results show its growth on the sheath regions if the gas temperature increases from 300 kelvins to 500 kelvins.
机译:在本文中,对在高压(100Torr)和低压(150V)下由射频激励(13.56 MHz)产生的氩微放电进行了电气特性的数值研究。结果表明,射频电压是导致等离子体电势升高的原因。而且,我们发现,气体温度的升高导致微空心阴极的孔内和孔外的等离子体密度降低,并且还影响鞘中等离子体电势的降低。结果,护套的厚度变宽。鞘中电子温度的变化受微型反应器中气体温度的影响。结果表明,如果气体温度从300开尔文升至500开尔文,则其在鞘区域的生长。

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