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Chip Package Interaction with fine pitch Cu pillar bump using mass reflow and thermal compression bonding assembly process for 20nm/16nm and beyond

机译:芯片封装与精细间距的铜柱凸点之间的相互作用,采用质量回流和热压键合组装工艺,适用于20nm / 16nm及更高的工艺

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摘要

This paper summarizes key learnings on 20/16nm CPI (Chip-Package-Interaction) challenges at 100um pitch and below to support ever increasing performance/cost/form factor demands for high performance mobile SoCs. CPI solutions for two types of Cu pillar interconnects using mass reflow and thermal compression type assembly process respectively are studied in technology development/production, and separate bump cell structures are proposed.
机译:本文总结了在100um间距及以下的20 / 16nm CPI(芯片封装交互)挑战方面的主要经验,以支持对高性能移动SoC不断增长的性能/成本/外形要求。在技​​术开发/生产中,分别研究了两种采用质量回流和热压型组装工艺的铜柱互连的CPI解决方案,并提出了单独的凸块单元结构。

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