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Post-bond test of Through-Silicon Vias with open defects

机译:具有开放缺陷的硅通孔的键合后测试

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Through Silicon Vias (TSVs) are critical elements in three dimensional integrated circuits (3-D ICs) and are susceptible to undergo defects at different stages: during their own fabrication, the bonding stage or during their life time. Typical defects are microvoids, underfilling, misalignement, pinholes in the oxide or misalignments during bonding in such a way that resistive opens become a frequent failure mechanism affecting TSVs. Although there is considerable research effort dedicated to improve TSVs testing, no much attention has been paid to weak defects, especially to weak open defects (resistive opens) causing small delays. In this work, a testing strategy is proposed to detect small delay defects by means of a post-bond oscillation test. Variations in the Duty Cycle of transmitted signals after unbalanced logic gates are shown to detect weak open defects in TSVs. HSPICE simulations including process parameter variations show the effectiveness of the method in the detection of weak open defects above 1 kΩ.
机译:硅通孔(TSV)是三维集成电路(3-D IC)中的关键元素,容易在不同的阶段遭受缺陷:在其自身的制造,键合阶段或使用寿命期间。典型的缺陷是微孔,底部填充,错位,氧化物中的针孔或键合过程中的错位,其方式是电阻性开路成为影响TSV的常见失效机制。尽管有大量的研究工作致力于改善TSV的测试,但是对于弱缺陷,尤其是引起小延迟的弱开路缺陷(电阻性开路),并没有给予足够的重视。在这项工作中,提出了一种测试策略,以通过键合后振荡测试来检测小的延迟缺陷。显示了不平衡逻辑门之后传输信号占空比的变化,可检测出TSV中的弱开路缺陷。 HSPICE仿真(包括工艺参数变化)表明,该方法在检测1kΩ以上的弱开路缺陷方面是有效的。

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