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Process Optimization for Ultrasonic Vibration Assisted Polishing of Micro-Structured Surfaces on Super Hard Material

机译:超声振动辅助超硬材料表面微结构抛光的工艺优化

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In consideration of the excellent property of SiC, the ground micro-structured surface quality is hard to meet the requirement, consequently the ultrasonic vibration assisted polishing (UVAP) of micro-structures of molds is proposed in this paper. Through the orthogonal experiment, the parameters of UVAP of micro-structures were optimized. The experimental results show that, abrasive polishing process, the effect of the workpiece feed rate on the surface roughness (Ra), groove tip radius (R) and material removal rate (MRR) of micro-structures is significant. While, the UVAP, the most significant effect factor for Ra, R and MRR is the ultrasonic amplitude of the ultrasonic vibration. In addition, within the scope of the polishing process parameters selected by preliminary experiments, ultrasonic amplitude of 2.5μm, polishing force of 0.5N, workpiece feed rate of 5 mnvmin~(-1), polishing wheel rotational speed of 50rpm, polishing time of 35min, abrasive size of 100nm and the polishing liquid concentration of 15% is the best technology of UVAP of micro-structures. Under the optimal parameters, the ground traces on the micro-structured surface were removed efficiently and the integrity of the edges of the micro-structure after grinding was maintained efficiently.
机译:考虑到SiC的优异性能,难以满足地面微结构化表面质量的要求,因此提出了模具微结构的超声振动辅助抛光(UVAP)。通过正交试验,优化了微结构的UVAP参数。实验结果表明,磨料抛光过程中,工件进给速度对微结构的表面粗糙度(Ra),槽尖半径(R)和材料去除率(MRR)的影响是显着的。而UVAP对Ra,R和MRR的最重要影响因素是超声振动的超声幅度。另外,在初步实验选择的抛光工艺参数范围内,超声振幅为2.5μm,抛光力为0.5N,工件进给速度为5 mnvmin〜(-1),抛光轮转速为50rpm,抛光时间为35min,磨料尺寸为100nm,抛光液浓度为15%,是微结构UVAP的最佳技术。在最佳参数下,有效去除了微结构表面上的研磨痕迹,并有效地保持了研磨后微结构边缘的完整性。

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