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A comparison of wafers sawn by resin bonded and electroplated diamond wire — From wafer to cell

机译:树脂键合和电镀金刚石线锯切的晶圆的比较—从晶圆到电池

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In this work we investigated the wafer quality from wafer process to cell process. These wafers were sawn by two types of diamond wire. The difference between the two types of diamond wires is the bonding layer — resin bonded and electroplated. To investigate the wafers' quality, few wafers are taken to test the breakage strength with bending test. We observed the wafer morphology with SEM. The subsurface damage was observed with TEM and Raman spectroscopy. At last wafers were made to cells for electrical performance verification.
机译:在这项工作中,我们研究了从晶片工艺到电池工艺的晶片质量。这些晶片用两种类型的金刚石线锯切。两种类型的金刚石线之间的区别在于粘合层-树脂粘合和电镀。为了研究晶片的质量,很少采用晶片通过弯曲测试来测试断裂强度。我们用SEM观察了晶片的形貌。用TEM和拉曼光谱观察了地下破坏。最后,将晶片制成电池以进行电性能验证。

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