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Large Current Emission from CNTs Cold Cathode

机译:CNTS冷阴极的电流发射大

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Carbon nanotubes (CNTs) have attracted great interest in the scientific field because of their unique structure, remarkable properties and potential applications. CNTs have been synthesized by methods such as arc discharge [1], chemical vapor deposition [2], laser ablation[3] etc. Such sustained, high-current field emission is necessary for many technological applications: for example, flat-panel field-emission displays require 10mA/cm{sup}2, while microwave power amplifier tubes require at least 400mA/cm{sup}2 [1]. These high-current density levels were previously obtainable only by thermionic emission above 1000K, or lithographically fabricated tips. Field emission has been reported from other forms of carbon, however, at lower current densities (0.3mA/cm{sup}2 for graphite [2], 30mA/cm{sup}2 for diamond (Refs. [3] and [4], and references therein)). CNTs cold cathode with large current density can take place of themionic cathode in power devices such as microwave amplifier tubes. In this paper, pristine Si (100) wafers were used as the substrates. We grew carbon nanobutes with thermal chemical vapor deposition (CVD). Prior to the growth, the substrates were supersonically cleaned in acetone, alcohol, and deionized water baths and subsequently, mounted into a chamber pumped to 10{sup}(-5) Torr. Then cuprum (Cu) film was vaporized onto the substrates. To study annealing effects, Si substrates coated with Cu films were annealed at a temperature range from 100~200°C for 2 hours in vacuum condition. Before patterned nickel layer (2 mm diameters) was sputtered as catalyst, Ar{sup}+ bombardment on Ni target has been performed for a few minutes to remove the oxidized surface layer on the Ni target. The specimens were placed into the quartz reactor (quartz tube of 80 cm in length and 5 cm in OD) for growing CNTs and were pumped down to less than ~10{sup}(-3) Torr using a mechanical pump. The catalyst layer was first reduced at 500°C in 50 Torr of flowing H{sub}2 (99.999% in purity) for 1 h to obtain the needed catalyst particles and enhance the catalytic activity. The substrates were then heated to a synthesis temperature while introducing H{sub}2 with a flow rate of 70 and 80 sccm, respectively. The synthesis temperature and pressure were approximately 700°C and 50 Torr, respectively. When temperature and pressure were stabilized, the hydrogen was replaced with mixture of C{sub}2H{sub}2 (99.6% in purity) and N{sub}2. The growth time was 1 h. The samples were then cooled in H{sub}2 flow ambient. After the growth, the morphologies of CNTs were examined by Scanning Electron Microscope (SEM). The morphologies of CNTs surface observed under a Scanning Electron Microscopy is shown in Fig 1. It can be seen that CNTs randomly distributed on catalyst layer and took on relatively uniform diameter about of 20~30 nm, the density of CNTs film was uniform in favor of field emission.
机译:由于其独特的结构,非凡的性能和潜在应用,碳纳米管(CNT)吸引了对科学领域的巨大兴趣。通过诸如电弧放电[1],化学气相沉积[2],激光烧蚀[3]等的方法合成了CNT。许多技术应用是必要的,对于许多技术应用来说是必要的:例如,平板领域所需的持续的高电流场发射-emission显示器需要10mA / cm {sup} 2,而微波功率放大器管需要至少400mA / cm {sup} 2 [1]。这些高电流密度水平预先通过1000K以上的热离子发射来获得,或光刻制造的提示。然而,从其他形式的碳报告了场发射,然而,对于钻石的较低电流密度(用于石墨[2],30mA / cm {sup} 2的较低电流密度(0.3mA / cm {sup} 2)(参考文献[3]和[4 ]和其中的引用))))。 CNT具有大电流密度的冷阴极可以在诸如微波放大器管的功率器件中进行主轴阴极。在本文中,使用原始Si(100)晶片作为基材。我们使用热化学气相沉积(CVD)生长碳纳米槽。在生长之前,基材在丙酮,醇和去离子水浴中进行超声清洗,随后,安装在泵送到10 {SUP}( - 5)托的腔室中。然后将Cuprum(Cu)膜蒸发到基材上。为了研究退火效果,在真空条件下在100〜200℃的温度范围内退火涂有Cu膜的Si底物。在被催化的镍层(2mm直径)之前,在催化剂中溅射,ar {sup} +在Ni靶标轰炸已经进行了几分钟以除去Ni靶标去除氧化表面层。将标本置于石英反应器(石英管长度为80cm,OD中5厘米),用于生长CNT,并使用机械泵向下泵送至小于〜10°( - 3)托。首先将催化剂层在500℃下在50℃下在50℃下流动的H {} 2(纯度为99.999%)1小时,得到所需的催化剂颗粒并增强催化活性。然后将基板加热至合成温度,同时引入具有70和80sccm的流速的H {Sub} 2。合成温度和压力分别为约700℃和50托。当温度和压力稳定时,用C {亚} 2H {亚} 2的混合物(纯度为99.6%)和N {} 2,将氢气替换。生长时间为1小时。然后将样品在H {亚} 2流动环境中冷却。生长后,通过扫描电子显微镜(SEM)检查CNT的形态。在扫描电子显微镜下观察到的CNT表面的形态如图1所示。可以看出,随机分布在催化剂层上的CNT,具有约20〜30nm的相对均匀的直径,CNT膜的密度有利于均匀场发射。

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