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Control of drain induced barrier lowering in short channel poly-Si TFTs for AMOLED displays

机译:控制用于AMOLED显示器的短沟道多晶硅TFT中漏极引起的势垒降低

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摘要

In this work, we investigate the impact of drain induced barrier lowering on threshold voltage variation in short channel polycrystalline silicon thin-film transistors (poly-Si TFTs). In particular, two types of modified TFT structure with short channel are designed to enhance the pixel performance for active-matrix organic light-emitting diode (AMOLED) displays. Numerical analysis combining 2-D device simulation and statistical pixel modeling shows that proposed p-type TFT structures can realize less threshold voltage deviation with high immunity of short channel effect, which is suitable for the current-driven device such as organic light-emitting diode (OLED).
机译:在这项工作中,我们研究了漏极感应势垒降低对短沟道多晶硅薄膜晶体管(poly-Si TFT)中阈值电压变化的影响。特别地,设计了两种具有短沟道的改进型TFT结构,以增强有源矩阵有机发光二极管(AMOLED)显示器的像素性能。结合二维器件仿真和统计像素建模的数值分析表明,所提出的p型TFT结构可实现较小的阈值电压偏差,具有短沟道效应的高抗扰性,适用于有机发光二极管等电流驱动器件(OLED)。

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