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Noise Behavior of InP-Based Double-Gate and Standard HEMTs: a Comparison

机译:基于INP的双门和标准HEMTS的噪声行为:比较

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A comparison of the dynamic and noise behavior between InAlAs/InGaAs Double-Gate (DG) and standard High Electron Mobility Transistors (HEMTs) is performed by means of Monte Carlo simulations. The DG-HEMT exhibits a considerably improved extrinsic behavior (especially f_(max)) over the corresponding standard HEMT, mainly due to the lower gate resistance. Concerning noise, even if the intrinsic P, R and C parameters show a modest improvement in the DG-HEMT, the extrinsic minimum noise figure F_(min) reveals a significantly better extrinsic noise performance.
机译:通过蒙特卡罗模拟进行Inalas / IngaAs双栅极(DG)和标准高电子迁移率晶体管(HEMT)之间的动态和噪声行为的比较。 DG-HEMT在相应的标准HEMT上表现出相当改善的外在行为(特别是F_(最大)),主要是由于较低的栅极电阻。关于噪声,即使内在P,R和C参数显示DG-HEMT的适度改进,外在最小噪声系数F_(min)也显示出明显更好的外部噪声性能。

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