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Evaluation of mechanical property of Sn-Ag bonding layer adopting Ni(P)/Cu Bi-layer diffusion barrier for 3D integration

机译:采用Ni(P)/ Cu双层扩散阻挡层进行3D集成的Sn-Ag粘结层的力学性能评估

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The mechanical properties of bonding layer have a great impact on the reliability of 3D integration. In this study, to improve the mechanical properties of bonds, Sn-Ag solder layer and the Ni(P)/Cu bi-layer diffusion barrier were adopted for high reliability of 3D integration bonding. These combinations reveal noticeably high bonding strength and can be explained through their microstructures. The bonding strength increased drastically between 200°C and 250°C, which suggested that the microstructure evolution of the bonding layer influenced the bonding strength greatly. For the samples with a Sn-Ag bonding layer, the bonding strength is much higher than that of Sn bonding layer sample, in the range of 250°C and 275°C. These results can be attributed to the presence of small Ag3Sn IMCs that had formed in high density and were dispersed throughout the bonding layer, which improved the mechanical strength. This result highlights the possibility of acquiring a control window to produce a bonding structure with a high mechanical reliability on Cu pillar bonding.
机译:粘合层的机械性能对3D集成的可靠性有很大的影响。在这项研究中,为提高键合的机械性能,采用了Sn-Ag焊料层和Ni(P)/ Cu双层扩散阻挡层,以实现3D集成键合的高可靠性。这些组合显示出显着的高结合强度,并且可以通过其微观结构来解释。在200℃至250℃之间,粘结强度急剧增加,这表明粘结层的微观结构演变极大地影响了粘结强度。对于具有Sn-Ag键合层的样品,在250℃至275℃的范围内,键合强度比Sn键合层样品的键合强度高得多。这些结果可以归因于以高密度形成并分散在整个粘结层中的小型Ag3Sn IMC的存在,从而提高了机械强度。该结果突出了获得控制窗口以产生对铜柱键合具有高机械可靠性的键合结构的可能性。

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