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Methods to Improve Performance of the 1.3-(mu)m Oxide-Confined GaInNAs/GaAs QW VCSELs

机译:提高1.3-(mu)M氧化密闭增益/ GaAs QW Vcsels性能的方法

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Comprehensive computer simulation has been used to investigate an impact of various possible structure modifications of the 1.3-(mu)m oxide-confined GaAs-based GaInNAs quantum-well (QW) vertical-cavity surface-emission diode lasers (VCSELs) on their operation. In particular, an influence on various physical phenomena crucial for the VCSEL operation and leading to some beneficial improvements in the VCSEL performance, i.e. detuning of the cavity mode with respect to the maximal optical gain, sizes and localizations of one or two the oxide apertures, sizes of the possible proton implantation and the step-like active-region QW structure, has been examined. A possibility to achieve the efficient 1.3-(mu)m radiation, to reduce the VCSEL threshold current, to improve the VCSEL operation at elevated temperatures and to preserve the single-fundamental-mode operation are used as criteria of the desirable VCSEL performance. It has been concluded from our analysis, that the best performance of the 20-(mu)m diameter VCSEL may be expected in its structure in which the proper detuning of the cavity mode towards longer wavelengths, the proper step-like active-region QW structure as well as the proper separate confinements of the optical field with the oxide aperture and the current funneling with the proton implantation are simultaneously applied.
机译:综合计算机模拟已被用于研究各种可能的结构修改的基于1.3-(mu)氧化局限于基于GaaS量子阱(QW)垂直腔表面发射二极管激光器(Vcsels)的影响它们的操作。特别地,对各种物理现象对VCSEL操作至关重要的影响,并且导致VCSEL性能的一些有益改进,即腔模式相对于最大光学增益,氧化物孔径的最大光学增益,尺寸和典型的损伤,已经研究了可能的质子植入和阶梯状有效区域QW结构的尺寸。实现有效的1.3-(mu)M辐射,以降低VCSEL阈值电流,以改善高温下的VCSEL操作并保留单基模式操作用作所需VCSEL性能的标准。从我们的分析中得出结论,20-(mu)米直径Vcsel的最佳性能可以在其结构中预期,其中腔模式朝向较长波长的适当静止,适当的阶梯状有效区域qw同时施加结构以及利用氧化物孔的光场和具有质子植入的电流漏斗的适当独立的隔音。

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