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Synthesis of ZnO nanowires using lower temperature vapor based methods

机译:使用低温蒸气法合成ZnO纳米线

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In this paper, we elaborate on protocols for growing ZnO nanowires using different vapor deposition techniques to provide a comparative study for low temperature based deposition. Effects of various parameters ranging from process temperatures to material compositions were investigated. Growth from ZnO thin film seed layers and catalytic growth using Au nanoparticles were performed as well as growth on blank Si substrates for comparison. Detailed results of SEM and XRD studies are presented for the ZnO nanowires. The lowest temperature achieved was approximately 750 °C with nanowires having diameters of 30-50 nm and lengths of 200-300 nm using VS method with a ZnO thin film seed to obtain complete surface coverage. In order to make the vapor based methods compatible with biosensors with monolithic readout circuits, the conventional thermal budget of commonly employed CMOS technology (usually around 450 °C) needs to be considered. Thus, lower temperature growth is preferable. In this regard, we address the temperature aspect of the growth for CMOS compatibility. We identify the effects of important process parameters and present a comprehensive investigation and comparative study of various factors on ZnO nanowire growth.
机译:在本文中,我们详细介绍了使用不同的气相沉积技术生长ZnO纳米线的协议,以提供基于低温的沉积的比较研究。研究了从工艺温度到材料成分的各种参数的影响。进行了从ZnO薄膜种子层的生长和使用Au纳米颗粒的催化生长以及在空白Si衬底上的生长以进行比较。给出了ZnO纳米线的SEM和XRD研究的详细结果。纳米线的直径为30-50 nm,长度为200-300 nm,使用VS方法和ZnO薄膜种子获得的最低温度约为750°C,以获得完全的表面覆盖。为了使基于蒸气的方法与带有单片读出电路的生物传感器兼容,需要考虑常用的CMOS技术的常规热预算(通常在450°C左右)。因此,较低的温度增长是优选的。在这方面,我们针对CMOS兼容性解决了温度增长方面的问题。我们确定重要的工艺参数的影响,并提出了对ZnO纳米线生长的各种因素的综合研究和比较研究。

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