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Field emission performance of nanostructured carbon films

机译:纳米结构碳膜的场发射性能

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The field emission performance of n-type NCD films with different composition and nanostructure is investigated in detail by analyzing the different role played by composition, grain size and orientation in the attempt to identify the material better suited for cold emitters realization in terms of low voltage operation, current driving capability and stability. Different configurations of collecting electrodes are employed to verify the occurrence of nitrogen induced morphology changes and partial orientation into elongated in plane diamond domains. By increasing nitrogen content up to N2=25% the threshold field for an electron emission current density of 1 muA/mm decreases from 25 V mum-1 down to 11 V mum-1. In addition, by comparing the field emission performance achieved for the sample with N2 = 25% using planar and vertical electrode arrangements, a further reduction of threshold electric field from 11 to 7.5 V mum-1 and much higher emission current density (up to 50 mA/cm2) are found, without showing fatigue effects after prolonged emission. Thanks to the composition and to the orientation of carbon emission sites, the N2 = 25% UNCD film then appears the elective material for the realization of stable cold cathodes.
机译:通过分析组成,粒度和取向的不同作用,详细研究了具有不同组成和纳米结构的N型NCD膜的场排放性能,试图确定在低电压方面更适合冷发射器实现的材料操作,电流驱动能力和稳定性。采用不同的收集电极配置来验证氮诱导的形态变化的发生和部分取向在平面金刚石结构域中的伸长率。通过将氮气含量增加到N 2 = 25%,用于1 mua / mm的电子发射电流密度的阈值场从25V毫米 -1 -1℃下降到11V妈妈 -1 。另外,通过使用平面和垂直电极装置比较用N 2 = 25%的样品实现的场发射性能,进一步减少了11至7.5V毫米的阈值电场 - 发现1 和更高的发射电流密度(高达50 mA / cm 2 ),而不显示延长发射后的疲劳效果。由于组合物和碳发射位点的取向,N 2 = 25%的UNCLD薄膜随后出现了实现稳定的冷阴极的选择性材料。

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