ALD growth behavior of high-k nanolayers on various substrates characterized by X-Ray Spectrometry in gracing incidence geometry

摘要

In the grazing incidence regime XRS and NEXAFS provide the sensitivity to investigate low mass depositions in the sub-nanometer regime even if they are buried under capping layers of up to 100 nm. The methodologies are nondestructive and in the case of the reference-free approach XRS provides a high reliability combined with a high flexibility in respect to the material systems of interest.