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Fluxless bonding for fine-pitch and low-volume solder 3-D interconnections

机译:无助焊剂用于小间距和小批量焊料3D互连

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Fluxless bonding can be used for fine-pitch low-solder-volume interconnections for three-dimensional large-scale integrated-circuit (3D-LSI) applications. Surface treatments with hydrogen radicals, formic acid, vacuum ultraviolet (VUV), and Ar plasma were evaluated as candidate methods for fluxless bonding. Three-μm-thick Sn solders were evaluated for intermetallic-compound (IMC) bonding of 3D integration as a target material for fluxless bonding. X-ray photoelectron spectroscopy (XPS), Auger electron spectro-scopy (AES), time-of-flight secondary ion mass spectrometry (TOF-SIMS), a scanning electron microscope (SEM), and a focused ion beam scanning ion microscope (FIB-SIM) were used to examine the samples. The experiments shows solder oxides and organic contaminants on the surfaces of the micro-bumps were most effectively eliminated without flux by hydrogen radical treatment among various treatments we evaluated. Bonding strength was also improved by the hydrogen radical treatment, since the shear strength was more than 50 times stronger than that of the untreated samples.
机译:无助焊剂可用于三维大规模集成电路(3D-LSI)应用的小间距低焊料量互连。使用氢自由基,甲酸,真空紫外线(VUV)和Ar等离子体进行的表面处理被评估为无助焊剂的候选方法。对3μm厚的Sn焊料进行了3D集成的金属间化合物(IMC)焊接,作为无焊剂焊接的目标材料进行了评估。 X射线光电子能谱(XPS),俄歇电子能谱(AES),飞行时间二次离子质谱(TOF-SIMS),扫描电子显微镜(SEM)和聚焦离子束扫描离子显微镜( FIB-SIM)用于检查样品。实验表明,在我们评估的各种处理方法中,通过氢自由基处理可以最有效地消除微凸块表面上的焊料氧化物和有机污染物,而不会产生助焊剂。由于抗剪强度比未处理的样品强50倍以上,因此通过氢自由基处理也提高了粘合强度。

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