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INVESTIGATION OF THE INFLUENCE OF SOLAR CELL PROCESSING ON STRUCTURAL DEFECTS IN HPMC-SI WAFERS BY PHOTOLUMINESCENCE IMAGE ANALYSIS

机译:光致发光图像分析对太阳能电池处理对HPMC-Si晶片结构缺陷的影响

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In this paper we investigate the effect of selected processing steps used in Si solar cell fabrication on the recombination activity of grain boundaries (GBs) and other structural defects in high performance multicrystalline silicon (HPMC-Si) wafers. Such defects can in many cases be improved or completely removed using suitable processes, such as impurity gettering and hydrogen passivation, which is accomplished during existing solar cell production. Here we aim to both improve existing production processes with respect to bulk lifetime, as well as introduce new, dedicated processes designed for defect engineering and material quality improvement of HPMC-Si wafers, thus working towards closing the remaining efficiency gap between multi- and monocrystalline Si wafers. Groups of neighbouring wafers from different HPMC Si ingots, have been passed through various processing steps, and subsequently etched down and re-passivated to assess the bulk lifetime of the final solar cells. Photoluminescence (PL) lifetime imaging are then used to generate lifetime maps before and after a selected contact firing process to investigate the effect of GB hydrogenation during this process. The recombination strength of GBs was quantified by numerical simulations of charge carrier diffusion based on line scans of the carrier lifetime. A simplified performance metric was then used to quantify and correlate the recombination of a large number of GBs to the crystallographic properties of the GBs, measured by a Laue scanner on neighbouring wafers.
机译:在本文中,我们研究了Si太阳能电池制造在晶界(GBS)的重组活性对高性能多晶硅(HPMC-Si)晶片的其它结构缺陷的选择对Si太阳能电池制造的影响。这种缺陷可以在许多情况下通过合适的方法改善或完全除去,例如杂质吸气和氢钝化,这在现有的太阳能电池生产期间完成。在这里,我们旨在改进现有的生产流程和批量生产,并引入新的专用流程,专为HPMC-Si晶圆的缺陷工程和材料质量改进而设计,从而努力关闭多晶硅和单晶之间的剩余效率差距Si晶圆。来自不同HPMC Si锭的相邻晶片的组已经通过了各种处理步骤,随后蚀刻并重新静置以评估最终太阳能电池的体寿命。然后使用光致发光(PL)寿命成像在选定的接触烧制过程之前和之后产生寿命图,以研究该方法期间GB氢化的影响。通过基于载体寿命的线扫描的电荷载流子扩散的数值模拟来定量GBS的重组强度。然后使用简化的性能度量来量化和将大量GBS的重组与GBS的结晶特性相关,通过邻近晶片上的Laue扫描仪测量。

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