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Effect of the Seed Polarity for High Quality 4H-SiC Crystal Grown on 6H-SiC Seed by PVT Method

机译:PVT法生长在6H-SiC晶种上的高质量4H-SiC晶体的晶种极性的影响

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The single crystal ingots by using a sublimation technique were grown on 6H-SiC dual-seed crystals with opposite face polarities and then SiC crystal wafers sliced from the SiC ingot were systematically investigated to find out the polarity dependence of the crystal quality. The growth rate of the SiC crystal grown in this study was about 0.2mm/hr. N-type 2" SiC crystals exhibiting the 4H- and 6H-SiC polytype were successfully fabricated on C-face and Si-face, respectively. The incorporation of nitrogen donors in the SiC crystals grown on the C-face seed crystal was exhibited to be higher than in SiC crystals grown on a Si-face crystal. When the SiC crystal ingot proceeded to grow, the SiC crystal region grown on the C-face seed crystal was enlarged compared to the SiC crystal region on the Si-face seed crystal.
机译:利用升华技术在具有相反面极性的6H-SiC双晶晶体上生长单晶锭,然后系统地研究从SiC锭切下的SiC晶体晶片,以发现晶体质量的极性依赖性。在这项研究中生长的SiC晶体的生长速率约为0.2mm / hr。分别在C面和Si面成功制备了具有4H-和6H-SiC多型性的N型2“ SiC晶体。显示了氮供体在C面种晶上生长的SiC晶体中的结合。 SiC晶锭继续生长时,C面籽晶上生长的SiC晶体区域比Si面籽晶上的SiC晶体区域大。 。

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