首页> 外文会议>Proceedings of the 8th Spanish Conference on Electron Devices >Pass-transistors pMOS based 8T SRAM cell for layout compaction
【24h】

Pass-transistors pMOS based 8T SRAM cell for layout compaction

机译:基于晶体管的pMOS 8T SRAM单元,用于布局紧凑

获取原文
获取外文期刊封面目录资料

摘要

We present a new 8-transistor (8T) SRAM cell design that uses pMOS devices as cell pass transistors controlled by the write word-line signal. The main advantage of this schema is the composition of a balanced 8T SRAM cell having four nMOS and four pMOS transistor that enables a more compact layout and area reduction. An exhaustive analysis about the impact on key parameters such as leakage consumption, write and read stability margins, read delay time and single event upsets for the new cell is reported. A trade-off between cell area reduction and write noise margin improvement is observed, while the remaining parameters are not impacted.
机译:我们提出了一种新的8晶体管(8T)SRAM单元设计,该设计使用pMOS器件作为由写入字线信号控制的单元传输晶体管。该方案的主要优点是组成一个具有四个nMOS和四个pMOS晶体管的平衡8T SRAM单元,从而可以实现更紧凑的布局和面积减小。报告了有关对关键参数的影响的详尽分析,这些影响包括泄漏消耗,写入和读取稳定性裕度,读取延迟时间和新单元的单个事件异常。观察到了在单元面积减小和写噪声容限提高之间的折衷,而其余参数没有受到影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号