Nano-Patterns Fabricated by Soft Press and Temperature-Pressure Variation Imprint

摘要

Nano-devices are increasingly required, the fabrication cost of nano-devices is quite high due to high resolution requirement. Nanoimprint lithography(NIL) is a promising technology for nano devices fabrication due to its low cost and high resolution. However, it still suffers from the large area uniformity and imprint defects problems. Herein, temperature-pressure variation soft press process are used in Simultaneous Thermal and UV (STU) imprint to enhance the uniformity and quality of pattern. This method is used to pattern high quality photonic crystals and gratings.