New Superimposed Pulsed Plasma Technology Using High Power Impulse Magnetron Sputtering (HiPIMS) Combined with DC or MF-Frequency

摘要

High Power Pulse Magnetron Sputtering (HPPMS), also known as High Power Impulse Magnetron Sputtering (HiPIMS) is a novel pulse plasma technology for coating applications. New developments in DC pulse power controllers allow very high peak power pulses. Combining DC power or medium frequency (MF) pulse power to HPPMS/HiPIMS processes offers significant advantages in the plasma and surface technologies. This technology is appropriate for single and dual magnetron applications and synchronized pulsed bias. It allows higher process rates for metallic and reactive sputtering applications. Processes, such as co-sputtering with different target materials using dual magnetron systems and asymmetric bipolar pulse modes are possible. Applicable HPPMS/HiPIMS pulse packages with superimposed DC or MF sputtering open new fields of applications.