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W Gradedly-doped Diamond-like Carbon Thin Films

机译:W渐变掺杂类金刚石碳薄膜

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W gradedly-doped diamond-like carbon films were deposited on silicon and stainless steel by a hybrid technique combining ion beam deposition with magnetron sputtering.The structure,mechanical performance,friction coefficient,and wear loss were investigated.With increasing W target current applied,the structure of the as-prepared films changed from amorphous DLC to a composite of metal-containing DLC and metal carbides; the content of sp3 structure decreased from 31.26% to 22.3%;the nanohardness increased from 12 GPa to 28 GPa; the elastic modulus increased from 170 GPa to 310 GPa; and the critical loads were in the range of 80~100 N.The comprehensive tribological property of the as-prepared samples was improved after W doping.
机译:采用离子束沉积与磁控溅射相结合的混合技术,在硅和不锈钢上沉积了W级掺杂的类金刚石碳膜,研究了其结构,力学性能,摩擦系数和磨损损失。随着W目标电流的增加,所制备的膜的结构从非晶态的DLC转变为含金属的DLC和金属碳化物的复合物。 sp3结构的含量从31.26%降低到22.3%;纳米硬度从12 GPa增加到28 GPa;弹性模量从170 GPa增加到310 GPa;钨掺杂后,所制备样品的综合摩擦学性能得到改善。

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