首页> 外文会议>IEEE International SOC Conference >3-D Placement Considering Vertical Interconnects
【24h】

3-D Placement Considering Vertical Interconnects

机译:3-D考虑垂直互连的位置

获取原文

摘要

3-D integration is going to play an important role in the future. Increasing complexity and increasing impact of interconnects to Integrated Circuit (1C) performance makes 3-D more and more attractive. EDA tools for 3-D design hardly exist. We propose a new 3-D standard-cell placer based on quadratic programming. It ensures a reduction of the total wirelength and can deal with standard cells and vertical interconnects simultaneously. The final result is a legalized, design rule compliant and discrete 3-D placement.
机译:3-D集成将来在未来发挥重要作用。互连对集成电路(1C)性能的增加和互连的影响提高了3D越来越有吸引力。对于3-D设计的EDA工具几乎没有存在。我们提出了一种基于二次编程的新的3-D标准单元放置器。它确保减少总线长度,并可以同时处理标准单元和垂直互连。最终结果是合法化,设计规则兼容和离散的3-D放置。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号