首页> 外文会议>International conference on processing manufacturing of advanced materials;THERMEC 2009 >Shape Memory Behavior of Ti-Ni-X (X= Pd, Cu) Ternary Alloy Thin Films Prepared by Triple-Source DC Magnetron Sputtering
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Shape Memory Behavior of Ti-Ni-X (X= Pd, Cu) Ternary Alloy Thin Films Prepared by Triple-Source DC Magnetron Sputtering

机译:三源直流磁控溅射制备Ti-Ni-X(X = Pd,Cu)三元合金薄膜的形状记忆行为

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We have deposited the Ti-Ni-X films having various compositions while keeping the Ti content to be ~50at% by means of triple-source dc magnetron sputtering. All of the annealed films showed thermoelastic martensitic transformation. M_s temperature of the Ti-Ni-Pd films increased with increasing Pd content, and the highest M_s temperature of ~180°C was attained for the Ti-23%Ni-27%Pd film. On the other hand, M_s temperature of Ti-Ni-Cu films slightly increases as Cu content increases. The transformation hysteresis is decreased rapidly down to 15~20°C by adding Pd or Cu more than 10at%. Both ternary alloy films showed shape memory behavior during thermal cycling tests under various constant stresses. The critical stress against plastic deformation, σ_c, of the Ti-Ni-Cu films is higher than that of the Ti-Ni-Pd films. The recoverable strain of these ternary alloy films is found to be ~2%. Actuation response by Joule's heat induced shape memory effect of Ti-Ni shape memory alloy films was slightly improved by the addition of Pd or Cu into the alloy.
机译:我们已经沉积了具有各种组成的Ti-Ni-X膜,同时通过三源dc磁控管溅射使Ti含量保持在约50at%。所有退火的膜均显示出热弹性马氏体相变。 Ti-Ni-Pd薄膜的M_s温度随Pd含量的增加而增加,Ti-23%Ni-27%Pd薄膜的M_s最高温度达到〜180°C。另一方面,Ti-Ni-Cu膜的M_s温度随着Cu含量的增加而略微升高。通过添加超过10at%的Pd或Cu,相变滞后迅速降低至15〜20°C。两种三元合金膜在各种恒定应力下的热循环测试中均显示出形状记忆行为。 Ti-Ni-Cu膜抵抗塑性变形的临界应力σ_c高于Ti-Ni-Pd膜。这些三元合金薄膜的可恢复应变为〜2%。通过在合金中添加Pd或Cu,焦耳热诱导的Ti-Ni形状记忆合金膜的致动响应得到了略微的改善。

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