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Shape Memory Behavior of Ti-Ni-X (X=Pd, Cu) Ternary Alloy Thin Films Prepared by Triple-Source DC Magnetron Sputtering

机译:Ti-Ni-X(X = Pd,Cu)三元合金薄膜的形状记忆行为通过三源DC磁控溅射制备

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We have deposited the Ti-Ni-X films having various compositions while keeping the Ti content to be ~50at% by means of triple-source dc magnetron sputtering. All of the annealed films showed thermoelastic martensitic transformation. M_s temperature of the Ti-Ni-Pd films increased with increasing Pd content, and the highest M_s temperature of ~180°C was attained for the Ti-23%Ni-27%Pd film. On the other hand, M_s temperature of Ti-Ni-Cu films slightly increases as Cu content increases. The transformation hysteresis is decreased rapidly down to 15~20°C by adding Pd or Cu more than 10at%. Both ternary alloy films showed shape memory behavior during thermal cycling tests under various constant stresses. The critical stress against plastic deformation, σ_c, of the Ti-Ni-Cu films is higher than that of the Ti-Ni-Pd films. The recoverable strain of these ternary alloy films is found to be ~2%. Actuation response by Joule's heat induced shape memory effect of Ti-Ni shape memory alloy films was slightly improved by the addition of Pd or Cu into the alloy.
机译:我们已经沉积具有各种组合物的Ti-Ni-X膜,同时通过三源DC磁控溅射将Ti含量保持为约50at%。所有退火的薄膜都显示出热弹性的马氏体转化。 Ti-Ni-Pd膜的M_S温度随着Pd含量的增加而增加,对于Ti-23%Ni-27%Pd膜,获得了〜180℃的最高M_S温度。另一方面,随着Cu含量的增加,Ti-Ni-Cu膜的M_S温度略微增加。通过增加Pd或Cu超过10at%,转化滞后快速降至15〜20℃。在各种恒定应力下热循环试验期间,两个三元合金薄膜显示出形状的记忆行为。 Ti-Ni-Cu膜的塑性变形σ_c的临界应力高于Ti-Ni-Pd膜的临界应力。发现这些三元合金薄膜的可回收菌株为约2%。通过将Pd或Cu加入合金,通过将焦耳的热诱导形状记忆效果略微提高了Ti-Ni形状记忆合金膜的致动响应。

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